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May 17th 2017

What drives SADP BEOL variability?

By: Michael Hargrove, Semiconductor Process & Integration Engineer Until EUV lithography becomes a reality, multiple patterning technologies such as triple litho-etch (LELELE), self-aligned double patterning (SADP), and self-aligned quadruple patterning (SAQP) are being used to meet the stringent patterning demands of...

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