Predicting Actual from Virtual
Solving process modeling, design automation, and integration challenges for the semiconductor and MEMS industries.

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IBM, Coventor use virtual fabrication at 22nm

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Fast analysis of Acoustic Resonators for the rapidly growing Premium RF Filter market

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Develop and optimize manufacturing process flows, reducing time consuming and costly experimental learning cycles.

Design and integrate MEMS and IoT devices significantly faster, without developing and maintaining custom models.

 
 

July 20th 2016

Pattern Dependence Process Modeling

By:   Joseph Ervin, Director – Semiconductor Process & Integration Engineering First order process modeling can help tremendously with process setup and integration challenges that occur in a semiconductor fabrication flow, by visualizing process variation problems “virtually” prior to actual fabrication. ...

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