Predicting Actual from Virtual
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IBM, Coventor use virtual fabrication at 22nm

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January 28th 2016

Advanced Lithography and Process Variation Modeling Using SEMulator3D

By:   Jimmy Gu, Coventor Technical Staff One of the top and probably toughest challenges that process integrators are facing today in a silicon fab is process variability. As a former process integrator working hard to ramp up the yield of...

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