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April 12th 2017

Photoresist shape in 3D: Understanding how small variations in photoresist shape significantly impact multi-patterning yield

By: Mustafa B. Akbulut, Ph.D., Team Lead, Quality Assurance, Semiconductor Solutions Things were easy for integrators when the pattern they had on the mask ended up being the pattern they wanted on the chip. Multi-patterning schemes such as Self-Aligned Double...

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