Blog


Breakthrough MEMS Models for System and IC Designers

Gunar Lorenz, PhD
Director, System Level Simulation

We just rolled out MEMS+ 5.0 with lots of new capabilities for our users. I discussed some of the new features, support of scanning mirrors in particular, in a previous post. This time I would like to focus on the new capabilities for exporting reduced order models (ROMs) of MEMS devices that system engineers can place in their Simulink schematics and IC designers can place in their circuit schematics.

Before getting into the technical stuff, allow me to provide some motivation. To design the control and signal processing electronics that go around every MEMS device, system engineers usually work in Simulink while circuit designers work in schematic entry tools such as Cadence Virtuoso. There’s a MEMS block in their flow diagram or schematic with an underlying model that captures the coupled electromechanical behavior of the MEMS device. It’s common practice to “hand craft” the MEMS behavioral model, but hand crafted models have many shortcomings: they’re usually over simplified, capturing only one degree of freedom and omitting nonlinear effects. Furthermore, it’s difficult to keep hand crafted models in sync with evolving device designs. All of these shortcomings can be avoided by using ROMs exported from MEMS+ instead of hand-crafted models.
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Coventor Expands MEMS Modeling Offering With Latest Release of MEMS+® Tool Suite

MEMS+ 5.0 features expanded library of device structures; enhanced model export capability improves speed and visualization for MEMS + IC design

CARY, North Carolina – September 8, 2014 – Coventor®, Inc., the leading supplier of design automation software for micro-electromechanical systems (MEMS), today announced immediate availability of the latest version of its MEMS+® design solution for accelerating development of advanced MEMS devices and systems. MEMS+ 5.0 features an expanded modeling library to enable simulation of a greater variety of devices, with a particular focus on the unique challenges of micro-mirrors and piezo-electric devices. It also adds a new capability to create and export reduced-order models (ROMs) to the MATLAB® Simulink® environment from The MathWorks, Inc. to enable extremely fast and accurate non-linear simulations of MEMS-based systems. This supplements the existing capability to export ROMs in Verilog-A format for simulations of MEMS with electronics in widely used EDA simulators such as the Cadence® Spectre® circuit simulator.
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SEMulator3D: GlobalFoundries Process Variation Reduction

by Paul McLellan
SemiWiki

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At SEMICON last month, Rohit Pal of GlobalFoundries gave a presentation on their methodology for reducing process variation. It was titled Cpk Based Variation Reduction: 14nm FinFET Technology.

Capability indices such as Cpk is a commonly used technique to assess the variation maturity of a technology. It looks at a given parameter’s variability and compares it to 6 sigma. The higher the number the better, 1.33 should have the process yielding close to 100% (for that parameter) and 2 is the full 6 sigma. Using Cpk makes it easy to track metrics to assess variation improvement for a technology. They can also be used as a gating item for technology milestone achievement. However, it is not truly an absolute value, it is a function of the specification limits.

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SISPAD – September 9 – 11, 2014 – Yokohama, Japan

SISPAD
2014 International Conference on Simulation of Semiconductor Processes and Devices
September 9 – 11, 2014

SISPAD
Co-sponsored by The Japan Society of Applied Physics
Technical co-sponsored by The IEEE Electron Devices Society

This conference provides an opportunity for the presentation and discussion of the latest advances in modeling and simulation of semiconductor devices, processes, and equipment for integrated circuits.

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The Unsung Heroes of CoventorWare

By Steve Breit, Vice President Engineering

The CoventorWare 2014 release has been announced and is now available to customers. I presided over the first release of CoventorWare in 2001 and eight major releases since then with numerous updates in between. With each release, we added new capabilities, and capacity, speed, and accuracy improvements to address the ever more demanding requirements of our users. The new capabilities and performance improvements in each release are easy to talk about and receive all the glory. In this respect, CoventorWare 2014 is no different: the highlights are covered in our press release and a What’s New page elsewhere on our site; I won’t repeat them here. Instead, I want to talk about the steady improvements in the usability, robustness and quality of the software and the documentation. These improvements aren’t as glamorous as the shiny new stuff, but I believe they really matter to users. Our quality assurance team and our documentation team deserve a lot of credit for these improvements. They’re the unsung heroes of CoventorWare.
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Taking a leap forward from TCAD

SemiWiki
by Pawan Fangaria

We all know that Technology Computer Aided Design (TCAD) simulations are essential in developing processes for semiconductor manufacturing. From the very nature of these simulations (involving physical structure and corresponding electrical characteristics of a transistor or device), they are predominantly finite-element based simulations with complex set of equations to be solved which require large computation, thus increasing simulation time exponentially with the size of the device. It was okay for earlier generations of semiconductor technology nodes to rely on transistor or small cell level process and characterization to develop large designs which were then verified through several build-and-test cycles through actual foundries. However, for today’s nanometer technology nodes and large, complex, high-density designs with complex transistor structures like FinFET and others which exhibit excessive variability in manufacturing, it’s clear that the same old methodology will no longer be effective. . Along with the technology, the economics of chip manufacturing and marketing has become equally pressing, needing substantial reduction in P/Q ratio and very high TAT in order take advantage of ever shrinking windows of opportunity.
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