Rapid Yield Optimization at 22nm Through Virtual Fab

SemiWiki.com
by Pawan Fangaria

Remember? During DAC 2013 I talked about a new kind of innovation: A Virtual Fabrication Platform, SEMulator3D, developed by COVENTOR. Now, to my pleasant surprise, there is something to report on the proven results from this platform. IBM, in association with COVENTOR, has successfully implemented a 3D Virtual Fabrication methodology to rapidly improve the yield of high performance 22nm SOI CMOS technology.

The CTO-Semiconductor of COVENTOR, Dr. David M. Fried was in attendance while IBM’s Ben Cipriany presented an interesting paper on this work at The International Conference on Simulation of Semiconductor Processes and Devices (SISPAD 2013). The paper is available at the link “IBM, Coventor present 22nm Virtual Fabrication Success at SISPAD” at the COVENTOR website.

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