Latest release focuses on solving the bigger, more complex challenges of verifying the next-generation of integrated MEMS devices with more accuracy and greater efficiency.
- What drives SADP BEOL variability?
- Photoresist shape in 3D: Understanding how small variations in photoresist shape significantly impact multi-patterning yield
- MEMS Microphones – A Bright Spot among Commoditized Consumer Sensors
- Semiconductor Process Development: Finding a Faster Way to Profitability
TAGS5NM 7 nm ASML BEOL career opportunities Coventor Directed Self Assembly DSA ETCH EUV GLOBALFOUNDRIES imec INTEL job opening lithography MEMS MEMS+ mems accelerometer mems design MEMS Design Software mems microphone mems simulation MEMS technology Moore's Law multi-patterning Online Articles Press release Process Development Process Integration Process Modeling Process Simulation Process Variability SADP SAQP Self-Aligned Quadruple Patterning semiconductor process modeling semiconductor process variation SEMulator3D Silicon Designs silicon photonics ST Microelectronics TCAD TSMC virtual fabrication X-Fab