The European edition of MEMS Executive Congress strives to strengthen the global connection of the MEMS supply chain. This one day executive event features panels, keynote speakers, and a special dinner at ETH Zurich.
- Photoresist shape in 3D: Understanding how small variations in photoresist shape significantly impact multi-patterning yield
- MEMS Microphones – A Bright Spot among Commoditized Consumer Sensors
- Semiconductor Process Development: Finding a Faster Way to Profitability
- The Value of Integrating Process Models with TCAD Simulation (and some tips on how to do it)
TAGS5NM 7 nm ASML BEOL career opportunities Coventor Directed Self Assembly DSA ETCH EUV GLOBALFOUNDRIES imec INTEL job opening LAM RESEARCH lithography MEMS MEMS+ mems accelerometer mems design MEMS Design Software mems microphone mems simulation MEMS technology Moore's Law multi-patterning Online Articles Press release Process Development Process Integration Process Modeling Process Simulation Process Variability SAQP Self-Aligned Quadruple Patterning semiconductor process modeling semiconductor process variation SEMulator3D Silicon Designs silicon photonics ST Microelectronics TCAD TSMC virtual fabrication X-Fab