MEMS Process Development with SEMulator3D

The rapid evolution of MEMS applications places significant constraints on MEMS technology development. There is tremendous pressure to accelerate process development to keep pace with current demand while also innovating for the next generation. The ability to model new process flows, verify designs, and document process decisions with SEMulator3D offers a compelling advantage for process engineers facing these challenges.

MEMS Process Development

A SEMulator3D model of a MEMS mirror. SEMulator3D is able to model the mirror as well as the CMOS circuit beneath it.

Process engineers often know what to expect from a single deposit or etch step and can predict its effect on device geometry. But when known steps are combined into novel sequences, the final geometry can be hard to predict. With SEMulator3D, engineers can emulate new process sequences step-by-step and capture critical information about interactions between steps without running costly test wafer runs.

Virtual Manufacturing “… allows engineers to readily develop and test a large number of process step combinations and novel process flows using multiple physical design patterns, which wouldn’t be possible in a real manufacturing environment or would be costly to perform. The model for each process step can be calibrated through experimental measurements, resulting in very reliable result-models that can be reused in multiple combinations.”
- Teledyne DALSA

 

SEMulator3D can also be used to generate process documentation once a process is complete and ramp-up to production begins. If production goals require moving fabrication to a new facility or OEM fab, SEMulator3D is a great tool for communicating requirements and expected results.

For examples of MEMs devices modeled with SEMulator3D, please visit our Solutions Gallery.

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