NAND

Coventor Adds Device Analysis Capabilities to SEMulator3D 7.0

New in SEMulator3D 7.0:  Powerful new process and device simulation capabilities

 

For Immediate Distribution
For more information, contact:
Toni Sottak
(408) 876-4418,
toni@wiredislandpr.com

 Coventor Adds Device Analysis Capabilities to SEMulator3D 7.0

New Features Enable SEMulator3D Version 7.0 to Address Both Process Modeling and Device Analysis for Better Insight into Advanced Semiconductor Technology Development

CARY, NC– February 28, 2018 – February 26, 2018 – Coventor, Inc., a Lam Research Company, the leading supplier of design automation solutions for semiconductor devices and micro-electromechanical systems (MEMS), today announced the availability of SEMulator3D® 7.0 – the newest version of its semiconductor virtual fabrication platform. With added features, performance improvements, and a new Device Analysis capability, SEMulator3D 7.0 addresses both process and device simulation while lowering the barriers to advanced semiconductor technology development.  The new Device Analysis capability enables seamless understanding of how process changes, process variability, and integration schemes directly impact transistor device performance.   read more…

Tagged , , , , , , , , , , , , , , , , , , , , , , , , , , , , , ,

7nm Lithography Choices

se_logoBy Mark Lapedus

Chipmakers are ramping up their 16nm/14nm logic processes, with 10nm expected to move into early production later this year. Barring a major breakthrough in lithography, chipmakers are using today’s 193nm immersion and multiple patterning for both 16/14nm and 10nm.

Now, chipmakers are focusing on the lithography options for 7nm. For this, they hope to use a combination of two technologies at 7nm—extreme ultraviolet (EUV) lithography, and 193nm immersion with multi-patterning.

read the full article here

Tagged , , , , , , , , , , , , , , , , , , , , , , , , , , , , , ,