Process Modeling

Asymmetric variability issues could impact 7nm processes

By Luke Collins, Tech Design Forum

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New variability issues highlighted by a massive process simulation exercise could make it more difficult than expected to achieve the performance advantages of emerging 7nm and 5nm processes.

Nano-electronics research centre imec has worked with Coventor to simulate the process variability of its 7nm BEOL fabrication processes using Coventor’s SEMulator3D virtual fabrication platform. The simulation of a full process window, looking at how multiple parameters of multiple processes interact, would have taken one million wafers to complete using conventional methods.

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Imec, Coventor expand collaboration to optimize 7 nm semiconductor manufacturing processes

• Joint development team leverages SEMulator3D to explore semiconductor process  variation issues at unprecedented levels
• Collaboration team has conducted a massive computer modeling simulation of a million
wafers to explore process variability in 7nm BEOL semiconductor fabrication
• The extending collaboration aims to further advance the availability, yield and cost of
manufacturing processes for the next generation of 7 nm semiconductor products

Leuven, Belgium & Cary, North Carolina, United States – December 7, 2015 – Imec, a
world-leading nanoelectronics research center and Coventor, a leading supplier of semiconductor process development tools, today announced the expansion of a joint development project to explore process variation issues in 7nm semiconductor technology. read more…

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Intel Announces Production-Ready 22nm 3-D Tri-Gate Transistor

Yesterday Intel announced its readiness for high-volume manufacturing of 3-D tri-gate (FinFET) transistors. Among other benefits, the tri-gate configuration allows Intel to manufacture higher performance fully-depleted devices without resorting to Silicon-On-Insulator (SOI) wafers. The performance gains quoted by Intel over their own 32nm planar transistor technology are impressive, including a 37% speed increase at low voltage , 18% speed increase at high voltage and 50% or greater power reduction at constant performance. All these performance benefits come with only a 2-3% cost increase.
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Process Simulation vs. Process Emulation: is SEMulator3D really TCAD?

I was interested to note that Silvaco has recently listed SEMulator3D as a competitor for their VICTORY Process Cell software on their website. It’s great to be mentioned as a contender in the TCAD process simulation space. But I’d like to take the opportunity to examine the following question – are SEMulator3D and VICTORY Process Cell really direct competitors?

On the surface, both SEMulator3D and VICTORY Process Cell can do some similar things. Both tools are fast, layout driven process modeling engines that are designed to build 3D models of MEMS and semiconductor devices. Both tools can model individual process steps or entire process sequences, and can model a variety of process and device types. And both tools can create meshes suitable for further physics simulation.

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