semiconductor process variation

What drives SADP BEOL variability?

By: Michael Hargrove, Semiconductor Process & Integration Engineer

Until EUV lithography becomes a reality, multiple patterning technologies such as triple litho-etch (LELELE), self-aligned double patterning (SADP), and self-aligned quadruple patterning (SAQP) are being used to meet the stringent patterning demands of advanced back-end-of-line (BEOL) technologies.  For the 7nm technology node, patterning requirements include a metal pitch of 40nm or less. This narrow pitch requirement forces the use of spacer based pitch multiplication techniques. Unfortunately, these techniques have high process/lithography variability, which can severely impact RC and overall device performance.

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Photoresist shape in 3D: Understanding how small variations in photoresist shape significantly impact multi-patterning yield

By: Mustafa B. Akbulut, Ph.D., Team Lead, Quality Assurance, Semiconductor Solutions

Things were easy for integrators when the pattern they had on the mask ended up being the pattern they wanted on the chip. Multi-patterning schemes such as Self-Aligned Double Patterning (SADP) and Self-Aligned Quadruple Patterning (SAQP) have changed that dramatically. Now, what you have on the mask determines only a part of what you will get at the end. read more…

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Statistics Software Engineer – Waltham, MA

Statistics Software Engineer – Waltham, MA

At Coventor Inc., we build innovative software products to solve semiconductor technology challenges. Our 3D modeling software is revolutionizing the way that semiconductor chips are fabricated around the world. Enabled by our core intellectual property – an accelerated 3D voxel modeling and visualization engine – our software is evolving fast as our business and customer base expand rapidly.

The effects of process variation in advanced semiconductor technologies are difficult to predict. We are seeking a talented software engineer with Matlab and Python experience to focus on implementing new statistical analysis capabilities. The addition of experimental design (DOE), statistical analysis, and data visualization capabilities to our modeling platform will provide valuable and novel insights into process variation. In your role as a member of the Analytics team, you will contribute to our analytics engine and its interfaces with SEMulator3D’s architecture, infrastructure and user interface. Your work will focus on development of new software capabilities and features using Matlab and Python.

Great engineering is Coventor’s heart and soul. Our software is envisioned and created by world-class engineers in many disciplines: software engineering, numerical physics, statistics, electrical engineering, quality assurance and development operations. Since our inception as an MIT spin-off in Technology Square, we’ve focused on agility by enabling individuals to take initiative and find innovative solutions to hard problems. At Coventor, we hire engineers with broad skills who are ready to contribute in multiple ways to create our next great software product.

Responsibilities:

  • Research and implement new analytics engine capabilities, primarily in Matlab
  • Prototype data visualizations in Matlab and Python and participate in deployment via Python, QCustomPlot, or Matlab
  • Work with UI and QA teams to enable and validate product features
  • Participate in general software engineering tasks, including verification, testing, bug fixing and maintenance of existing code for the Analytics product

 

Required Qualifications:

  • BS in scientific or engineering field with 3+ years of experience
  • Strong Matlab knowledge and experience (3+ years coding)
  • Some Python experience
  • Knowledge of or interest in statistics and multivariate data analysis demonstrated by multiple standard university or Coursera classes
  • Ability to learn new algorithms/technologies and solve problems

 

Desirable Qualifications (any of the following):

  • Ph.D. in applied statistics/mathematics, scientific, or engineering field with significant experience in data modeling and applied statistics
  • Professional experience solving real-world problems (beyond Coursera or standard university classes) with many of the following: DOE, multivariate statistics, optimization (constrained, gradient/simplex methods), linear regression, PCA, pattern recognition, multiple comparison testing, ANOVA, exploratory data analysis and visualization, machine learning, etc./li>
  • 3+ years of experience in a professional software development position in scientific simulation or visualization
  • Strong Python experience (or possibly strong R, and willingness to learn Python)
  • Publications, patents, in-house/research software (i.e., other people routinely use your software/models inside a company, even if you have not done full professional software development).

 
This regular, full-time position is located in Waltham, MA. Coventor offers comprehensive benefits and is an EEO/AA Employer. You must be a current legal resident of the U.S. or have a valid U.S. visa to apply for this position. Please e-mail your resume to job1849@coventor.com.

About Coventor:

For more information about Coventor, our business, and our products, please visit us on
the web at http://www.coventor.com.

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AIM Photonics Welcomes Coventor as Newest Member

 

 

 

 

For Immediate Release: March 16, 2017

Contact:
Laura Magee (ESD) | laura.magee@esd.ny.gov | (716) 846-8239 | (800) 260-7313
ESD Press Office | PressOffice@esd.ny.gov | (800) 260-7313
Steve Ference (AIM) | sference@sunypoly.edu | 518-956-7319

CUS-Backed Initiative Taps Process Modeling Specialist to Enable Manufacturing of High-Yield, High-Performance Integrated Photonic Designs

Today’s Announcement Builds On Progress Of Finger Lakes Forward, The Region’s Award-Winning Strategic Plan To Generate Robust Economic Growth And Community Development

ROCHESTER, NY and CARY, NCThe American Institute for Manufacturing Integrated Photonics (AIM Photonics), a public-private partnership advancing the nation’s photonics manufacturing capabilities, and Coventor®, Inc., a semiconductor process modeling software company, today announced Coventor as the newest member of AIM Photonics. Coventor will provide access to its unique, physics-driven 3D modeling technology to improve the performance and manufacturability of complex, integrated photonic designs. read more…

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Coventor Unveils New Scientific Findings on Lithography Processing For Improved Semiconductor Scalability and Performance

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At SPIE Advanced Lithography 2017, Coventor Will Present Results of Studies to Increase Density and Yield of Next-Generation Semiconductor Devices

CARY, NC– February 13, 2017 – Coventor®, Inc., the leading supplier of virtual fabrication solutions for semiconductor devices and micro-electromechanical systems (MEMS), will present findings from its research on advanced semiconductor fabrication processes at SPIE Advanced Lithography 2017. The results of these studies provide insight into techniques for advancing the state-of-the-art in semiconductor technology through use of new and emerging photomask, lithography and process technologies. read more…

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The Value of Integrating Process Models with TCAD Simulation (and some tips on how to do it)

By: Shi Hao (Jacky) Huang, PhD, Semiconductor Process & Integration Engineer

Coventor January 2017 Blog Graphic

Coventor January 2017 Blog Graphic 2

 

 

 

 

Nowadays, novel semiconductor technologies have brought complex process flows to the fab.   These process flows are needed to support the manufacturing of advanced 3D semiconductor structures. It can be helpful to model process flows, and their effect on a novel device, prior to physical fabrication.

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Achieving the Vision of Silicon Photonics Processing

By: Sandy Wen, MSEE, Semiconductor Process and Integration Engineer, Coventor

Silicon Photonics Test Die

Silicon Photonics Test Die

With the increasing need for faster data transfer rates, the transition from electrical to optical signaling in data processing is inevitable.   Copper cabling cannot keep up with the upcoming data center bandwidth requirements, for applications such as multimedia streaming and high performance computing.  One technology that could enable true optical communication is silicon photonics. read more…

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Design Process Technology Co-Optimization for Manufacturability

By:   Dalong Zhao – Semiconductor Process & Integration Engineering

Yield and cost have always been critical factors for both manufacturers and designers of semiconductor products.   Meeting yield and product cost targets is a continuous challenge, due to new device structures and increasingly complex process innovations introduced to achieve improved product performance at each new technology node.  Design for manufacturability (DFM) and design process technology co-optimization (DTCO) are widely used techniques that can ensure the successful delivery of both new processes and products in semiconductor manufacturing.   In this article, we will discuss how 3D (3 dimensional) DTCO can be used to improve product yield and accelerate product delivery dates in semiconductor manufacturing. read more…

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