By: Shi Hao (Jacky) Huang, PhD, Semiconductor Process & Integration Engineer
Nowadays, novel semiconductor technologies have brought complex process flows to the fab. These process flows are needed to support the manufacturing of advanced 3D semiconductor structures. It can be helpful to model process flows, and their effect on a novel device, prior to physical fabrication.
Tagged Coventor, Finite Element Mesh, Finite Element Modeling, Process Development, Process Modeling, Process Simulation, Process Variability, semiconductor process modeling, semiconductor process variation, SEMulator3D, TCAD, TCAD Interface, TCAD Modeling, TCAD Simulation, Voxel mesh, Voxel-based mesh
I was interested to note that Silvaco has recently listed SEMulator3D as a competitor for their VICTORY Process Cell software on their website. It’s great to be mentioned as a contender in the TCAD process simulation space. But I’d like to take the opportunity to examine the following question – are SEMulator3D and VICTORY Process Cell really direct competitors?
On the surface, both SEMulator3D and VICTORY Process Cell can do some similar things. Both tools are fast, layout driven process modeling engines that are designed to build 3D models of MEMS and semiconductor devices. Both tools can model individual process steps or entire process sequences, and can model a variety of process and device types. And both tools can create meshes suitable for further physics simulation.