Author Archives: Sandra Liu

Innovative Solutions to Increase 3D NAND Flash Memory Density

By: Timothy Yang, Software Applications Engineer

Introduction

3D NAND flash memory has enabled a new generation of non-volatile solid-state storage useful in nearly every electronic device imaginable. 3D NAND can achieve data densities exceeding those of 2D NAND structures, even when fabricated on later generation technology nodes.  The methods used to increase storage capacity come with potentially significant tradeoffs in memory storage, structural stability, and electrical characteristics. This post will discuss the manufacturing challenges of 3D NAND structures, as well as techniques to advance the data density of 3D NAND devices, studied in our recent work.

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IEEE INERTIALS 2019 – April 1-5, 2019 – NAPLES, FL


Coventor is exhibiting!

What’s The Right Path For Scaling?

By Mark Lapedus

The growing challenges of traditional chip scaling at advanced nodes are prompting the industry to take a harder look at different options for future devices.S
caling is still on the list, with the industry laying plans for 5nm and beyond. But less conventional approaches are becoming more viable and gaining traction, as well, including advanced packaging and in-memory computing. Some options are already here, while others are still in R&D and require more funding to get off the ground. Some may never work.

read the full article here

SPIE Advanced Lithography 2019 – February 24-28, 2019 – San Jose, CA

Coventor is exhibiting! See us at booth #323/325. Coventor will be presenting a keynote on:

  • “Combining equipment sensors and control hardware with metrology and advanced computational methods for comprehensive 3D process control”

Coventor will also be giving oral presentations on:

  • “Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond”
  • “Self-aligned quadruple patterning assessment for 16nm half-pitch metal 2 BEOL using virtual fabrication”
  • “Backside power delivery as a scaling knob for future systems”

3D NAND: Challenges beyond 96-Layer Memory Arrays

By: Steve Shih-Wei Wang, PhD, SP&I Engineer

Unlike scaling practices in 2D NAND technology, the direct way to reduce bit costs and increase chip density in 3D NAND is by adding layers. In 2013, Samsung shipped the first V-NAND product using 24 layers and MLC [1]. Five years later, in 2018, vendors of 3D-NAND have all announced production plans for 96-Layer NAND using TLC [2]. According to recent news reports, vendors are already working on next generation 3D NAND that contains even more layers. What are the 3D NAND’s process challenges, and what might be its ceiling, as increasing numbers of layers are used?

Figure 1: 3D NAND Memory Array and Key Process Challenges (Source: Lam Research)

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Variation’s Long, Twisty Tail Worsens At 7/5nm

By Ed Sperling

Variation is becoming a bigger challenge at each new node, but not just for obvious reasons and not always from the usual sources. Nevertheless, dealing with these issues takes additional time and resources, and it can affect the performance and reliability of those chips throughout their lifetimes.

read the full article here

MEMS 2019 – January 27-31, 2019 – Soeoul, Korea

Coventor is exhibiting!

Visit us at booth #44.

SEMICON Korea 2019 – January 23-25, 2019 – Seoul, Korea

Coventor will be giving the following talks:

  • “Process variation studies and the impact on electrical performance”
  • “Smart Manufacturing and Machine Learning: Process Control in 3D”