(left) SEM image and (right) SEMulator3D image of process steps in the Dalsa MEMS process.
Dalsa Semiconductor and Coventor have published an article on the use of virtual fabrication for MEMS processing. Virtual fabrication process emulation backed up by experimental calibration is a more productive way to build integrated MEMS and CMOS systems than process simulation. It provides a link between fab and design, is a lower-cost and faster technique, and provides a unique method to understand and improve design and process interaction, and wafer control/inspection. It leverages the enormous knowledge and tooling that has been developed in CMOS semiconductor fabrication, and transfers that knowledge to the MEMS world.
Dr. Gerold Schröpfer is Technical Director for Europe and for the MEMS business operations worldwide. For the last ten years, Gerold has been responsible for overseeing Coventor’s European MEMS and semiconductor business activities, including the management of R&D programs, industrial and academic partnerships, and external business relationships. Dr. Schröpfer has more than 20 years of relevant experience in MEMS and semiconductor design, process development and EDA product development. Prior to his current position at Coventor, Gerold carried out pioneering work in the design and development of inertial, tire pressure and magnetic sensors at Sensitec and SensoNor (Infineon). Dr. Schröpfer holds a PhD in engineering science from the University of Neuchâtel (Switzerland) and Franche-Comté (France), as well as a degree in physics from the University of Giessen (Germany).
Figure 6 (left to right): Different profiles using pattern dependence for the antenna and sharp head shapes. a) Antenna shape with POR flow (b) Antenna profile with a gate CD of 26nm (c) Sharp head profile with a gate CD of 28nm (d) Sharp head profile with an etch.