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2020 SPIE Advanced Lithography conference

February 23 - February 27

Coventor is exhibiting! See us at booth #323.

We will also be giving an invited talk “Full stack computational optimization through process emulation” on Thursday, February 27 and a poster presentation entitled “Impact of EUV resist thickness on local critical dimension uniformities for <30 nm CD Via patterning” on Wednesday, February 26

Details

Start:
February 23
End:
February 27
Event Category:
Website:
http://www.spie.org/conferences-and-exhibitions/advanced-lithography

Venue

San Jose Convention Center
150 W San Carlos St
San Jose, CA 95113 United States
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