SPIE Advanced Lithography 2019 – February 24-28, 2019 – San Jose, CA

Coventor is exhibiting! See us at booth #323/325. Coventor will be presenting a keynote on:

  • “Combining equipment sensors and control hardware with metrology and advanced computational methods for comprehensive 3D process control”

Coventor will also be giving oral presentations on:

  • “Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond”
  • “Self-aligned quadruple patterning assessment for 16nm half-pitch metal 2 BEOL using virtual fabrication”
  • “Backside power delivery as a scaling knob for future systems”
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