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SPIE Advanced Lithography 2021
February 21, 2021 - February 25, 2021
Coventor will have 4 presentations at SPIE Advanced Lithography 2021:
“SSVT (Six Stacked Vertical Transistors) SRAM cell architecture introduction: design and process challenges assessment”
Authors: Benjamin Vincent, Joseph Ervin
24 February 2021 • 9:00 AM PST
“EPE variability comparison study of multiple patterning options for restricted 2D structures in advanced logic nodes”
Authors: Arup Saha, Brett Schroeder, Tsann-Bim Chiou, Fung S Ou (joint paper with ASML and Lam Research)
25 February 2021 • 9:40 AM PST
“Investigating the effect of variation and parasitics on the latest next generation architectures”
Author: Joseph Ervin
25 February 2021 • 11:30 AM PST | Part of SPIE Advanced Lithography
“Scatterometry-based calibration of process model for gate-all-around devices”
Author(s): Ye Feng, Joseph Ervin, Yang Lu, Anthony Woo, Martyn Coogans, Ivan Chakarov, David Fried, Lam Research Corp.
24 February 2021 • 11:00 AM PST