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SPIE Advanced Lithography 2021

February 21 - February 25

SPIE-Advanced-Lithography-Logo

Coventor will have 4 presentations at SPIE Advanced Lithography 2021:

 

“SSVT (Six Stacked Vertical Transistors) SRAM cell architecture introduction: design and process challenges assessment”

Authors:  Benjamin Vincent, Joseph Ervin

24 February 2021 • 9:00 AM PST

 

“EPE variability comparison study of multiple patterning options for restricted 2D structures in advanced logic nodes”

Authors: Arup Saha, Brett Schroeder, Tsann-Bim Chiou, Fung S Ou (joint paper with ASML and Lam Research)

25 February 2021 • 9:40 AM PST

 

“Investigating the effect of variation and parasitics on the latest next generation architectures”

Author: Joseph Ervin

25 February 2021 • 11:30 AM PST | Part of SPIE Advanced Lithography

 

“Scatterometry-based calibration of process model for gate-all-around devices”

Author(s): Ye Feng, Joseph Ervin, Yang Lu, Anthony Woo, Martyn Coogans, Ivan Chakarov, David Fried, Lam Research Corp.

24 February 2021 • 11:00 AM PST

Details

Start:
February 21
End:
February 25
Event Category:
Website:
https://spie.org/conferences-and-exhibitions/advanced-lithography?SSO=1

Venue

San Jose Marriott and San Jose Covention Center
301 S Market St
San Jose, CA 95113 United States
+ Google Map
Phone:
(408) 280-1300
Website:
http://www.marriott.com/hotels/travel/sjcsj-san-jose-marriott/?scid=bb1a189a-fec3-4d19-a255-54ba596febe2
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