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SPIE Advanced Lithography 2021

February 21, 2021 - February 25, 2021


Coventor will have 4 presentations at SPIE Advanced Lithography 2021:


“SSVT (Six Stacked Vertical Transistors) SRAM cell architecture introduction: design and process challenges assessment”

Authors:  Benjamin Vincent, Joseph Ervin

24 February 2021 • 9:00 AM PST


“EPE variability comparison study of multiple patterning options for restricted 2D structures in advanced logic nodes”

Authors: Arup Saha, Brett Schroeder, Tsann-Bim Chiou, Fung S Ou (joint paper with ASML and Lam Research)

25 February 2021 • 9:40 AM PST


“Investigating the effect of variation and parasitics on the latest next generation architectures”

Author: Joseph Ervin

25 February 2021 • 11:30 AM PST | Part of SPIE Advanced Lithography


“Scatterometry-based calibration of process model for gate-all-around devices”

Author(s): Ye Feng, Joseph Ervin, Yang Lu, Anthony Woo, Martyn Coogans, Ivan Chakarov, David Fried, Lam Research Corp.

24 February 2021 • 11:00 AM PST


February 21, 2021
February 25, 2021
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San Jose Marriott and San Jose Covention Center
301 S Market St
San Jose, CA 95113 United States
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(408) 280-1300
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