CoventorMP 1.1 Release Highlights

Release Date: March 30, 2018


CoventorMP 1.1 is a major update to the CoventorMP 1.0 release which was the first to include both MEMS+ and CoventorWare in a single installation. The 1.1 release includes a multitude of new features and capabilities that increase the value of the CoventorMP platform to both MEMS+ and CoventorWare users. The enhancements ease design entry for all users, improve modeling accuracy, and provide new, advanced analysis capabilities such as non-linear AC, electrostatic pull-in and noise analysis. These new analyses are built into the MEMS+ Simulator, opening new possibilities for MEMS designers who do not have access to the MathWorks or Cadence simulation environments. More information on all enhancements is provided below. Two new beta-quality features are also available to users, pointing the way to future enhancements.

Design Entry Enhancements

MEMS+ design entry has been enhanced to ease parametric model construction for MEMS+ and for CoventorWare users, as well as provide better support for MEMS Process Design Kits (PDKs):

  • The Deposit step in the Process Editor now allows multiple masks to pattern a single deposit, setting material color for subsequent visualization, and specifying vertical offset;
  • The Innovator interface for assembling 3D schematics now allows multiple levels of hierarchy, saving time by allowing re-use of parametric sub-structures in a device design; and
  • Users who have an existing device layout in GDS format can create a MEMS+ 3D schematic much faster: MEMS+ has a new capability to automatically construct a 3D schematic from imported GDS. This is a beta feature that will be further refined in future releases.

Component Library Enhancements

The MEMS+ library of device modeling primitives, known as the Component Library, has been enhanced to improve the accuracy of device models and extend the types of devices that can be modeled:

  • Split comb stator models now include the effects of sidewall angle on capacitance and electrostatic force. This is particularly important to MEMS gyro designers interested in predicting electrostatic effects on quadrature.
  • Suspension components have a new option to generate an extruded mesh of brick finite elements within the suspension, providing better accuracy for mechanical mode frequencies and other mechanical behavior of interest. This is a beta feature that will be extended to other components in future releases.
  • Users may specify custom values for the gas damping of perforations in rigid structures. This feature is particularly useful to MEMS microphone designers.
  • The Beam component has a new option to include piezo-resistive (PZR) effects that is useful for modeling nanometer-scale PZR gauges, such as are used in the CEA Leti M&NEMS technology.

New, Advanced Analysis Capabilities in MEMS+ Simulator

The MEMS+ Simulator includes new built-in analysis capabilities that are available with the Advanced Sensor Modeling add-on to base MEMS+ configurations:

  • Non-linear AC analysis, useful for predicting harmonic distortion in acoustic devices, and non-linear behavior in MEMS scanning mirrors such as those intended for Lidar systems.
  • Pull-In and Frequency Hysteresis analysis via a sophisticated algorithm that is more robust than a basic DC-sweep or Nonlinear AC analysis, respectively, and capable of predicting all instabilities in a system.
  • Noise analysis, suitable for computing Signal-to-Noise Ratio (SNR) of microphones and other sensors

Other Improvements

MEMS+ has a new C++ API that supports simulation in SystemC-AMS environments and enables end users to develop new kinds of analysis methods.

Finally, CoventorWare has been enhanced to support use of non-linear piezo-resistive coefficients in the MemPZR solver. This allows accurate prediction of nonlinear sensitivity effects in piezo-resistive pressure sensors.

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