LOG IN
REGISTER
COMPANY
ABOUT
CAREERS
PRESS RELEASE
PRESS COVERAGE
EVENTS
PRODUCTS
SEMulator3D
®
Semiconductor Process Modeling
Coventor
MP
®
MEMS Design Automation
CoventorWare
®
MEMS
+
®
SOLUTIONS
SEMICONDUCTOR SOLUTIONS
MEMS SOLUTIONS
RESOURCES
CASE STUDIES
BLOG
VIDEOS
CONTACT
SUPPORT
Request Demo
Home
Process Model Calibration
Filter by
Categories
Tags
Authors
Show all
All
Coventor Blog
Press Releases
All
3D NAND
BEOL
bulk Si
CFET
chip packaging
CoventorMP
Defect Analysis
DRAM
dry etch
DSOI
DTCO (Design Technology Co-Optimization)
Extreme Ultraviolet lithography
FEOL
FinFET
HVM
imec
Lithography and Patterning
MEMS
MEMS gyroscope
MEMS Inertial Sensors
MEMS Micro Mirror
MEMS Microphone
MEMS PDK (Process Design Kits)
MEMS Pressure Sensor
MEMS+
Process Model Calibration
Process Window Optimization
SEMulator3D
Silicon Photonics
SOI
SRAM
TCAD
Technology Reviews
All
Thomas
Arnaud Parent
Assawer Soussou
brett.schroeder@coventor.com
Brian
Benjamin Vincent
Chris DeSa
Coventor
David
David Fried
Daebin Yim
Dalong Zhao
Gerold Schropfer
Hideyuki Maekoba
Jeonghoon Kim
jervin@coventor.com
Jimmy Gu
Jacky Huang
Jack Lapidas
Karin Conti
ken
Linda Spampinato
Mustafa Akbulut
Mattan Kamon
Admin
Michael Hargrove
Pradeep Nanja
QingPeng Wang
Ryan Miller
Sandra Liu
Sofiane Guissi
Steve Shih-Wei Wang
Sandy Wen
Sandra Liu
Timothy Yang
Tae Yeon Oh
Chris Welham
wpengine
Yu De Chen
July 21, 2020
Published by
Pradeep Nanja
at
July 21, 2020
Categories
Coventor Blog
Process Model Calibration: The Key to Building Predictive and Accurate 3D Process Models
Process engineers and integrators can use virtual process modeling to test alternative process schemes and architectures without relying on wafer-based testing. One important aspect of building an accurate process model
[…]
Request Demo
LOG IN
REGISTER