July 21, 2020
Figure 4: SEMulator3D model of the Spacer 1 Oxide Fin CD after PMC.   The oxide spacer is turquoise, and the red etch stop layer is amorphous silicon. TEM image with the SEMulator3D image aligned to show visual comparison. Note that sidewall angle and line to line measurements can be used with Process Model Calibration to tune for the deformation caused by the mandrel removal.  
Published by Pradeep Nanja at July 21, 2020
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Process Model Calibration: The Key to Building Predictive and Accurate 3D Process Models

Process engineers and integrators can use virtual process modeling to test alternative process schemes and architectures without relying on wafer-based testing. One important aspect of building an accurate process model […]
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