April 17, 2020
Fig.1. Bin illustration (a) Pass, (b) HR, (c) VML, (d) MML, (e) VMO, (f) VMS.
Published by QingPeng Wang at April 17, 2020
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Identifying and Preventing Process Failures at 7nm

Using failure bin classification, yield prediction and process window optimization to predict and enhance yield Device yield is highly dependent upon proper process targeting and variation control of fabrication steps, […]
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June 25, 2019
Lam Semiconductor Equipment
Published by Benjamin Vincent at June 25, 2019
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Controlling Variability using Semiconductor Process Window Optimization

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