September 14, 2021
Profile variation is one of the most important problems during semiconductor device manufacturing and scaling. These variations can degrade both chip yield and device performance. Virtual fabrication can be used […]
August 19, 2021
Netlist Extraction is an important SEMulator3D® capability that allows a user to extract parasitic resistance and capacitance for different line and via segments during process modeling. This detailed electrical netlist […]
July 20, 2021
It seems like yesterday that FinFETs were the answer to device scaling limitations imposed by shrinking gate lengths and required electrostatics. The introduction of FinFETs began at the 22 nm […]
June 16, 2021
Introduction With continuing FinFET device process scaling, micro loading control becomes increasingly important due to its significant impact on yield and device performance [1-2]. Micro-loading occurs when the local etch […]
May 27, 2021
People think that semiconductor process simulation libraries should be developed using a perfect theoretical background that is strongly supported by empirical data. This might be true in academic research, where […]
April 15, 2021
In the semiconductor modeling world, no simulation software can do everything. That is, each has its own strengths – process modeling, lithography analysis, and circuit design being a few examples. […]
March 8, 2021
Static Random-Access Memory (SRAM) has been a key element for logic circuitry since the early age of the semiconductor industry. The SRAM cell usually consists of six transistors connected to […]
February 22, 2021
While contact gate pitch (GP) and fin pitch (FP) scaling continues to provide higher performance and lower power to FinFET platforms, controlling RC parasitics and achieving higher transistor performance at […]
January 19, 2021
How can virtual process libraries accelerate semiconductor process development? Process engineers develop ideal solutions to engineering problems using a logical theoretical framework combined with logical engineering steps. Unfortunately, many process […]
December 14, 2020
New integration and patterning schemes used in 3D memory and logic devices have created manufacturing and yield challenges. Industrial focus has shifted from the scaling of predictable unit processes in […]