TCAD

Transistor-Level Performance Evaluation Based on Wafer-Level Process Modeling

Posted in: Coventor Blog by Sandra Liu | Comments Off on Transistor-Level Performance Evaluation Based on Wafer-Level Process Modeling Tuesday, April 17, 2018

By: Michael Hargrove, SP&I Engineer

Three years ago, I wrote a blog entitled “Linking Virtual Wafer Fabrication Modeling with Device-level TCAD Simulation” in which I described the seamless connection between the SEMulator3D® virtual wafer fabrication software platform and external 3rd party TCAD software. I’m now happy to report that device-level I-V performance analysis is now a built-in module within the SEMulator3D software platform.  Users are no longer required to export a mesh and import it into a TCAD platform, when performing transistor I-V simulation.  Now, once the 3D device structure is built in SEMulator3D, transistor I-V simulation can be performed directly within SEMulator3D without need for 3rd party solvers.  Contacts and bias can be applied using the SEMulator3D device design, and I-V transistor characteristics can be determined for specific steps in the process flow.  You can perform direct transistor-level performance evaluation inside the SEMulator3D software platform, without needing to export or import meshes. read more…

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Coventor Adds Device Analysis Capabilities to SEMulator3D 7.0

Posted in: Press Releases by Marketing | Comments Off on Coventor Adds Device Analysis Capabilities to SEMulator3D 7.0 Wednesday, February 28, 2018

New in SEMulator3D 7.0:  Powerful new process and device simulation capabilities

 

For Immediate Distribution
For more information, contact:
Toni Sottak
(408) 876-4418,
toni@wiredislandpr.com

 Coventor Adds Device Analysis Capabilities to SEMulator3D 7.0

New Features Enable SEMulator3D Version 7.0 to Address Both Process Modeling and Device Analysis for Better Insight into Advanced Semiconductor Technology Development

CARY, NC– February 28, 2018 – February 26, 2018 – Coventor, Inc., a Lam Research Company, the leading supplier of design automation solutions for semiconductor devices and micro-electromechanical systems (MEMS), today announced the availability of SEMulator3D® 7.0 – the newest version of its semiconductor virtual fabrication platform. With added features, performance improvements, and a new Device Analysis capability, SEMulator3D 7.0 addresses both process and device simulation while lowering the barriers to advanced semiconductor technology development.  The new Device Analysis capability enables seamless understanding of how process changes, process variability, and integration schemes directly impact transistor device performance.   read more…

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The Value of Integrating Process Models with TCAD Simulation (and some tips on how to do it)

Posted in: Coventor Blog by Marketing | Comments Off on The Value of Integrating Process Models with TCAD Simulation (and some tips on how to do it) Friday, January 20, 2017

By: Shi Hao (Jacky) Huang, PhD, Semiconductor Process & Integration Engineer

Coventor January 2017 Blog Graphic

Coventor January 2017 Blog Graphic 2

 

 

 

 

Nowadays, novel semiconductor technologies have brought complex process flows to the fab.   These process flows are needed to support the manufacturing of advanced 3D semiconductor structures. It can be helpful to model process flows, and their effect on a novel device, prior to physical fabrication.

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Process Simulation vs. Process Emulation: is SEMulator3D really TCAD?

Posted in: Coventor Blog by Marketing | Comments Off on Process Simulation vs. Process Emulation: is SEMulator3D really TCAD? Saturday, April 2, 2011

I was interested to note that Silvaco has recently listed SEMulator3D as a competitor for their VICTORY Process Cell software on their website. It’s great to be mentioned as a contender in the TCAD process simulation space. But I’d like to take the opportunity to examine the following question – are SEMulator3D and VICTORY Process Cell really direct competitors?

On the surface, both SEMulator3D and VICTORY Process Cell can do some similar things. Both tools are fast, layout driven process modeling engines that are designed to build 3D models of MEMS and semiconductor devices. Both tools can model individual process steps or entire process sequences, and can model a variety of process and device types. And both tools can create meshes suitable for further physics simulation.

read more…

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