• Skip to main content
  • LOG IN
  • REGISTER
Lam_Research_logo_WhiteLam_Research_logo_WhiteLam_Research_logo_WhiteLam_Research_logo_White
  • Home
  • Customer Portal
    • Coventor Licensing Downloads
    • SEMulator3D Downloads
    • CoventorMP Downloads
    • Webinars
    • MEMS+ Courses
  • System Requirements
  • Software Licensing
Contact Us
✕

Investigation of 3D Photoresist Profile Effect in Self-Aligned Patterning through Virtual Fabrication

Published by Sandra Liu at October 2, 2023
Categories
Tags
[featured_image]
Download
Download is available until [expire_date]
  • Version
  • Download 9
  • File Size 3.85 MB
  • File Count 1
  • Create Date October 2, 2023
  • Last Updated October 2, 2023

Investigation of 3D Photoresist Profile Effect in Self-Aligned Patterning through Virtual Fabrication

Share
Sandra Liu
Sandra Liu

Comments are closed.

© LAM RESEARCH CORPORATION. ALL RIGHTS RESERVED.
    Contact Us
    • LOG IN
    • REGISTER