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Coventor and CMC Microsystems expand collaboration to further enable innovation in semiconductor and microsystem technology development
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A Deposition and Etch Technique to Lower Resistance of Semiconductor Metal Lines
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Figure 2. Virtual metrology results for minimum and maximum area.

Pathfinding by process window modeling: Advanced DRAM capacitor patterning process window evaluation using virtual fabrication

DRAM, Lithography and Patterning, Process Window Optimization, SEMulator3D

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