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This paper presents the benefits of using statistical models during MEMS design, through the virtual reproduction of a test structure for measuring a beam’s pull-in voltage. This electrical measurement is used as a functional indicator of the process quality for manufactured wafers. Statistical variations of process parameters (material properties, silicon thickness, sidewall angle and edge shift due to etching tolerances) are included in our study using a MEMS Process Design Kit. This statistical data is used during Monte Carlo simulation, to evaluate the influence of expected manufacturing variability on the performance of our test structure.
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