3D NAND flash memory array, based on TCAT [1], with 16 cells per string, top gate-select layer and bottom source-select layer.
3D NAND Flash Processing
March 10, 2015
22nm Technology Yield Optimization Using Multivariate 3D Virtual Fabrication
September 9, 2013

You must have an account on our Customer Portal to access this content. If you already have an account, please log in using the form below or to the right. If you do not have an account, we invite you to request an account.

Existing Users Log In
   
Forgot password/username? Click here to reset
New User? Click here to register

Whitepaper:Evaluating MEMS Devices Virtual Metrology & DRIE

fin-patterning-for-FinFETs

To download your free white paper, please fill out the form below:

This paper explores the capabilities of Coventor’s powerful SEMulator3D semiconductor process modeling platform. In this detailed report, MEMS device virtual metrology and virtual fabrication of DRIE based structures is demonstrated. An RF Tunable capacitor, similar to a gyroscope with rotative displacement using comb-drive electrostatic actuation, is used to demonstrate virtual fabrication. Virtual metrology measurements are also extracted for the device. The tunable capacitor modeling exercise illustrates the platform’s capabilities, both in predictive design technology modeling and in virtual measurement data extraction.

You might also be interested in: