DTCO Archives - Coventor

The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance
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The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance
SVT (six stacked vertical transistors) SRAM cell architecture introduction: design and process challenges assessment
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SVT (six stacked vertical transistors) SRAM cell architecture introduction: design and process challenges assessment
Process Window Optimization of DRAM by Virtual Fabrication
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Process Window Optimization of DRAM by Virtual Fabrication
A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
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A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
Speeding Up Process Optimization with Virtual Processing
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Speeding Up Process Optimization with Virtual Processing
Design Technology Co-Optimization of 3D-monolithic standard cells and SRAM exploiting dynamic back-bias for ultra-low-voltage operation
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Design Technology Co-Optimization of 3D-monolithic standard cells and SRAM exploiting dynamic back-bias for ultra-low-voltage operation