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Deposition and Metallization
Influence of SiGe on Parasitic Parameters in PMOS
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Influence of SiGe on Parasitic Parameters in PMOS
Backside Power Delivery as a Scaling Knob for Future Systems
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Backside Power Delivery as a Scaling Knob for Future Systems
CMOS Area Scaling and the Need for High Aspect Ratio Vias
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CMOS Area Scaling and the Need for High Aspect Ratio Vias
Back-End-of-Line (BEOL) Metallization
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Back-End-of-Line (BEOL) Metallization
Back-End-of-Line (BEOL) Virtual Patterning
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Back-End-of-Line (BEOL) Virtual Patterning
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