Deposition and Metallization Archives | Coventor

LOG IN
REGISTER

COMPANY
- ABOUT
- CAREERS
- PRESS RELEASE
- PRESS COVERAGE
- EVENTS
PRODUCTS
- SEMulator3D^®
  Semiconductor Process Modeling
- CoventorMP^®
  MEMS Design Automation
  - CoventorWare^®
  - MEMS+^®
SOLUTIONS
- SEMICONDUCTOR SOLUTIONS
- MEMS SOLUTIONS
RESOURCES
- CASE STUDIES
- BLOG
- VIDEOS
CONTACT
SUPPORT

Home
Deposition and Metallization

Influence of SiGe on Parasitic Parameters in PMOS
Read more
Influence of SiGe on Parasitic Parameters in PMOS
Backside Power Delivery as a Scaling Knob for Future Systems
Read more
Backside Power Delivery as a Scaling Knob for Future Systems
CMOS Area Scaling and the Need for High Aspect Ratio Vias
Read more
CMOS Area Scaling and the Need for High Aspect Ratio Vias
Back-End-of-Line (BEOL) Metallization
Read more
Back-End-of-Line (BEOL) Metallization
Back-End-of-Line (BEOL) Virtual Patterning
Read more
Back-End-of-Line (BEOL) Virtual Patterning

Product Information

Resources

Company

© Copyright Coventor Inc., A Lam Research Company, 2020 All Rights Reserved
Privacy Policy • Terms of Use

LOG IN
REGISTER