• Skip to main content
  • LOG IN
  • REGISTER
Coventor_New_LogoCoventor_New_LogoCoventor_New_LogoCoventor_New_Logo
  • COMPANY
    • ABOUT
    • CAREERS
    • PRESS RELEASE
    • PRESS COVERAGE
    • EVENTS
  • PRODUCTS
    • SEMulator3D®
      Semiconductor Process Modeling
    • CoventorMP®
      MEMS Design Automation
      • CoventorWare®
      • MEMS+®
  • SOLUTIONS
    • SEMICONDUCTOR SOLUTIONS
    • MEMS SOLUTIONS
  • RESOURCES
    • CASE STUDIES
    • BLOG
    • VIDEOS
  • CONTACT
  • SUPPORT
Contact Us
✕
  • Home
  • Deposition and Metallization
  • Influence of SiGe on Parasitic Parameters in PMOS

    Read more - Influence of SiGe on Parasitic Parameters in PMOS
    Figure 6 Capacitance components and capacitance variance compared to different epi thicknesses
    Influence of SiGe on Parasitic Parameters in PMOS
  • Backside Power Delivery as a Scaling Knob for Future Systems

    Read more - Backside Power Delivery as a Scaling Knob for Future Systems
    Figure-4.-BS-PDN-Process-Flow-Summary
    Backside Power Delivery as a Scaling Knob for Future Systems
  • CMOS Area Scaling and the Need for High Aspect Ratio Vias

    Read more - CMOS Area Scaling and the Need for High Aspect Ratio Vias
    SV_Characterization
    CMOS Area Scaling and the Need for High Aspect Ratio Vias
  • Back-End-of-Line (BEOL) Metallization

    Read more - Back-End-of-Line (BEOL) Metallization
    M1 baseline process flow
    Back-End-of-Line (BEOL) Metallization
  • Back-End-of-Line (BEOL) Virtual Patterning

    Read more - Back-End-of-Line (BEOL) Virtual Patterning
    M2 Cu cross-section area analysis and graphical results
    Back-End-of-Line (BEOL) Virtual Patterning

Product Information

  • Product Offerings
  • Technical Support & Training
  • Licensing
  • System Requirements

Resources

  • Blog
  • Case Studies
  • Videos
  • 2018 MEMS Design Contest

Company

  • About
  • Press
  • Partners & Programs
  • Contact
© Copyright Coventor Inc., A Lam Research Company, All Rights Reserved
Privacy Policy • Terms of Use
Contact Us
  • LOG IN
  • REGISTER