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  • A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication

    Read more - A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication
    Figure 2: (a) Layout design, (b) Top view of a typical metal line generated, (c) cross sectional view of the metal line, (d) LER status of RMS and Correlation length split.

    A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication

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  • Evaluating the Impact of STI Recess Profile Control on Advanced FinFET Device Performance

    Read more - Evaluating the Impact of STI Recess Profile Control on Advanced FinFET Device Performance
    Fig. 3: Leakage current distribution from different directions.

    Evaluating the Impact of STI Recess Profile Control on Advanced FinFET Device Performance

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  • The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance

    Read more - The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance
    Figure 3: On/off-state current distribution at fin bottom (top figures: no residue; bottom figure: with residue).

    The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance

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  • A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM

    Read more - A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
    wiggling AA figure

    A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM

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  • Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning

    Read more - Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning
    SOC_L

    Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning

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  • New Techniques to Analyze and Reduce Etch Variation

    Read more - New Techniques to Analyze and Reduce Etch Variation
    ARDE lags as a function of silicon trench width

    New Techniques to Analyze and Reduce Etch Variation

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  • Evaluating MEMS Device Virtual Metrology & DRIE

    Read more - Evaluating MEMS Device Virtual Metrology & DRIE
    drie-profile

    Evaluating MEMS Device Virtual Metrology & DRIE

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