LOG IN
REGISTER
COMPANY
ABOUT
CAREERS
PRESS RELEASE
PRESS COVERAGE
EVENTS
PRODUCTS
SEMulator3D
®
Semiconductor Process Modeling
Coventor
MP
®
MEMS Design Automation
CoventorWare
®
MEMS
+
®
SOLUTIONS
SEMICONDUCTOR SOLUTIONS
MEMS SOLUTIONS
RESOURCES
CASE STUDIES
BLOG
VIDEOS
CONTACT
SUPPORT
Contact Us
Home
Etch
A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication
Read more
A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication
Evaluating the Impact of STI Recess Profile Control on Advanced FinFET Device Performance
Read more
Evaluating the Impact of STI Recess Profile Control on Advanced FinFET Device Performance
The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance
Read more
The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance
A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
Read more
A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning
Read more
Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning
New Techniques to Analyze and Reduce Etch Variation
Read more
New Techniques to Analyze and Reduce Etch Variation
Evaluating MEMS Device Virtual Metrology & DRIE
Read more
Evaluating MEMS Device Virtual Metrology & DRIE
Contact Us
LOG IN
REGISTER
