Lithography and Patterning Archives - Coventor

Pathfinding by process window modeling: Advanced DRAM capacitor patterning process window evaluation using virtual fabrication
Read more - Pathfinding by process window modeling: Advanced DRAM capacitor patterning process window evaluation using virtual fabrication
Pathfinding by process window modeling: Advanced DRAM capacitor patterning process window evaluation using virtual fabrication
A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication
Read more - A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication
A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication
A Triple-Deck CFET Structure with an Integrated SRAM Cell for the 2nm Technology Node and Beyond
Read more - A Triple-Deck CFET Structure with an Integrated SRAM Cell for the 2nm Technology Node and Beyond
A Triple-Deck CFET Structure with an Integrated SRAM Cell for the 2nm Technology Node and Beyond
A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
Read more - A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning
Read more - Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning
Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning
Backside Power Delivery as a Scaling Knob for Future Systems
Read more - Backside Power Delivery as a Scaling Knob for Future Systems
Backside Power Delivery as a Scaling Knob for Future Systems
Self-aligned Fin Cut Last Patterning Scheme for Fin Arrays of 24nm Pitch and Beyond
Read more - Self-aligned Fin Cut Last Patterning Scheme for Fin Arrays of 24nm Pitch and Beyond
Self-aligned Fin Cut Last Patterning Scheme for Fin Arrays of 24nm Pitch and Beyond
Virtual Fabrication and Advanced Process Control Improve Yield for SAQP Process Assessment with 16 nm Half-Pitch
Read more - Virtual Fabrication and Advanced Process Control Improve Yield for SAQP Process Assessment with 16 nm Half-Pitch
Virtual Fabrication and Advanced Process Control Improve Yield for SAQP Process Assessment with 16 nm Half-Pitch
CMOS Area Scaling and the Need for High Aspect Ratio Vias
Read more - CMOS Area Scaling and the Need for High Aspect Ratio Vias
CMOS Area Scaling and the Need for High Aspect Ratio Vias