Lithography and Patterning Archives - Coventor

A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication
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A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication
A Triple-Deck CFET Structure with an Integrated SRAM Cell for the 2nm Technology Node and Beyond
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A Triple-Deck CFET Structure with an Integrated SRAM Cell for the 2nm Technology Node and Beyond
A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
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A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning
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Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning
Backside Power Delivery as a Scaling Knob for Future Systems
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Backside Power Delivery as a Scaling Knob for Future Systems
Self-aligned Fin Cut Last Patterning Scheme for Fin Arrays of 24nm Pitch and Beyond
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Self-aligned Fin Cut Last Patterning Scheme for Fin Arrays of 24nm Pitch and Beyond
Virtual Fabrication and Advanced Process Control Improve Yield for SAQP Process Assessment with 16 nm Half-Pitch
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Virtual Fabrication and Advanced Process Control Improve Yield for SAQP Process Assessment with 16 nm Half-Pitch
CMOS Area Scaling and the Need for High Aspect Ratio Vias
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CMOS Area Scaling and the Need for High Aspect Ratio Vias
Process Modeling Exploration for 8 nm Half-Pitch Interconnects
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Process Modeling Exploration for 8 nm Half-Pitch Interconnects