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This paper uses Virtual Fabrication to assess the imec 7 nm node (iN7) Self-Aligned Quadruple Patterning (SAQP) integration scheme for the 16 nm half-pitch Metal 2 line formation. We first present the technical challenge of obtaining defect-free M2 lines with SAQP, and then provide a solution to achieve a <1% failure rate using a combination of Advanced Process Control and Virtual Fabrication.
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Benjamin Vincent, S. Lariviere, C. Wilson, R. H. Kim, and J. Ervin "Virtual fabrication and advanced process control improve yield for SAQP process assessment with 16 nm half-pitch", Proc. SPIE 10963, Advanced Etch Technology for Nanopatterning VIII, 109630Q (20 March 2019); doi: 10.1117/12.2518099;
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