SEMulator3D Archives - Coventor

Pathfinding by process window modeling: Advanced DRAM capacitor patterning process window evaluation using virtual fabrication
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Pathfinding by process window modeling: Advanced DRAM capacitor patterning process window evaluation using virtual fabrication
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A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication
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A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication
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Evaluating the Impact of STI Recess Profile Control on Advanced FinFET Device Performance
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Evaluating the Impact of STI Recess Profile Control on Advanced FinFET Device Performance
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The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance
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The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance
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SVT (six stacked vertical transistors) SRAM cell architecture introduction: design and process challenges assessment
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SVT (six stacked vertical transistors) SRAM cell architecture introduction: design and process challenges assessment
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A Triple-Deck CFET Structure with an Integrated SRAM Cell for the 2nm Technology Node and Beyond
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A Triple-Deck CFET Structure with an Integrated SRAM Cell for the 2nm Technology Node and Beyond
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Evaluation of the impact of source drain epi implementation on logic performance using combined process and circuit simulation
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Evaluation of the impact of source drain epi implementation on logic performance using combined process and circuit simulation
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Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle
Read more - Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle
Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle
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Process Window Optimization of DRAM by Virtual Fabrication
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Process Window Optimization of DRAM by Virtual Fabrication
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