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SEMulator3D
Evaluation of the impact of source drain epi implementation on logic performance using combined process and circuit simulation
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Evaluation of the impact of source drain epi implementation on logic performance using combined process and circuit simulation
Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle
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Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle
Process Window Optimization of DRAM by Virtual Fabrication
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Process Window Optimization of DRAM by Virtual Fabrication
A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
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A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
Process Model Calibration: The Key to Building Predictive and Accurate 3D Process Models
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Process Model Calibration: The Key to Building Predictive and Accurate 3D Process Models
A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options done by Virtual Fabrication
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A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options done by Virtual Fabrication
Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning
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Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning
A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options: Comparing Bulk vs. SOI vs. DSOI Starting Substrates
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A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options: Comparing Bulk vs. SOI vs. DSOI Starting Substrates
Speeding Up Process Optimization with Virtual Processing
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Speeding Up Process Optimization with Virtual Processing
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