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Pathfinding by process window modeling: Advanced DRAM capacitor patterning process window evaluation using virtual fabrication
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- Pathfinding by process window modeling: Advanced DRAM capacitor patterning process window evaluation using virtual fabrication
Pathfinding by process window modeling: Advanced DRAM capacitor patterning process window evaluation using virtual fabrication
A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication
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- A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication
A Study of the Impact of Line Edge Roughness on Metal Line Resistance using Virtual Fabrication
Evaluating the Impact of STI Recess Profile Control on Advanced FinFET Device Performance
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- Evaluating the Impact of STI Recess Profile Control on Advanced FinFET Device Performance
Evaluating the Impact of STI Recess Profile Control on Advanced FinFET Device Performance
The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance
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- The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance
The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance
SVT (six stacked vertical transistors) SRAM cell architecture introduction: design and process challenges assessment
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- SVT (six stacked vertical transistors) SRAM cell architecture introduction: design and process challenges assessment
SVT (six stacked vertical transistors) SRAM cell architecture introduction: design and process challenges assessment
A Triple-Deck CFET Structure with an Integrated SRAM Cell for the 2nm Technology Node and Beyond
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- A Triple-Deck CFET Structure with an Integrated SRAM Cell for the 2nm Technology Node and Beyond
A Triple-Deck CFET Structure with an Integrated SRAM Cell for the 2nm Technology Node and Beyond
Evaluation of the impact of source drain epi implementation on logic performance using combined process and circuit simulation
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- Evaluation of the impact of source drain epi implementation on logic performance using combined process and circuit simulation
Evaluation of the impact of source drain epi implementation on logic performance using combined process and circuit simulation
Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle
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- Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle
Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle
Process Window Optimization of DRAM by Virtual Fabrication
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- Process Window Optimization of DRAM by Virtual Fabrication
Process Window Optimization of DRAM by Virtual Fabrication
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