SEMulator3D Archives | Coventor

The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance
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The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance
SVT (six stacked vertical transistors) SRAM cell architecture introduction: design and process challenges assessment
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SVT (six stacked vertical transistors) SRAM cell architecture introduction: design and process challenges assessment
A Triple-Deck CFET Structure with an Integrated SRAM Cell for the 2nm Technology Node and Beyond
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A Triple-Deck CFET Structure with an Integrated SRAM Cell for the 2nm Technology Node and Beyond
Evaluation of the impact of source drain epi implementation on logic performance using combined process and circuit simulation
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Evaluation of the impact of source drain epi implementation on logic performance using combined process and circuit simulation
Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle
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Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle
Process Window Optimization of DRAM by Virtual Fabrication
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Process Window Optimization of DRAM by Virtual Fabrication
A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
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A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
Process Model Calibration: The Key to Building Predictive and Accurate 3D Process Models
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Process Model Calibration: The Key to Building Predictive and Accurate 3D Process Models
A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options done by Virtual Fabrication
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A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options done by Virtual Fabrication