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  • A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM

    Read more - A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
    wiggling AA figure
    A Study of Wiggling AA Modeling and its Impact on Device Performance in Advanced DRAM
  • Process Model Calibration: The Key to Building Predictive and Accurate 3D Process Models

    Read more - Process Model Calibration: The Key to Building Predictive and Accurate 3D Process Models
    Process Model Calibration: The Key to Building Predictive and Accurate 3D Process Models
  • A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options done by Virtual Fabrication

    Read more - A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options done by Virtual Fabrication
    A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options done by Virtual Fabrication
  • Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning

    Read more - Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning
    SOC_L
    Impact of EUV Resist Thickness on Local Critical Dimension Uniformities for <30 nm CD Via Patterning
  • A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options: Comparing Bulk vs. SOI vs. DSOI Starting Substrates

    Read more - A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options: Comparing Bulk vs. SOI vs. DSOI Starting Substrates
    A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options: Comparing Bulk vs. SOI vs. DSOI Starting Substrates
  • Speeding Up Process Optimization with Virtual Processing

    Read more - Speeding Up Process Optimization with Virtual Processing
    Figure 1 Once the model is set up, it results in the capacitor contact as shown. At this point, electrical analysis can be undertaken and the edge effect of the capacitor investigated
    Speeding Up Process Optimization with Virtual Processing
  • Advances in 3D CMOS Image Sensors Optical Modeling: Combining Realistic Morphologies with FDTD

    Read more - Advances in 3D CMOS Image Sensors Optical Modeling: Combining Realistic Morphologies with FDTD
    Comparison of light propagation simulated in two pixels
    Advances in 3D CMOS Image Sensors Optical Modeling: Combining Realistic Morphologies with FDTD
  • Backside Power Delivery as a Scaling Knob for Future Systems

    Read more - Backside Power Delivery as a Scaling Knob for Future Systems
    Figure-4.-BS-PDN-Process-Flow-Summary
    Backside Power Delivery as a Scaling Knob for Future Systems
  • Self-aligned Fin Cut Last Patterning Scheme for Fin Arrays of 24nm Pitch and Beyond

    Read more - Self-aligned Fin Cut Last Patterning Scheme for Fin Arrays of 24nm Pitch and Beyond
    Cross-sections-perpendicular-to-the-fins
    Self-aligned Fin Cut Last Patterning Scheme for Fin Arrays of 24nm Pitch and Beyond
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