FinFET and CFET Archives - Coventor

Evaluating the Impact of STI Recess Profile Control on Advanced FinFET Device Performance
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Evaluating the Impact of STI Recess Profile Control on Advanced FinFET Device Performance
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The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance
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The Effects of Poly Corner Etch Residue on Advanced FinFET Device Performance
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A Triple-Deck CFET Structure with an Integrated SRAM Cell for the 2nm Technology Node and Beyond
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A Triple-Deck CFET Structure with an Integrated SRAM Cell for the 2nm Technology Node and Beyond
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Evaluation of the impact of source drain epi implementation on logic performance using combined process and circuit simulation
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Evaluation of the impact of source drain epi implementation on logic performance using combined process and circuit simulation
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Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle
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Process Variation Analysis of Device Performance Using Virtual Fabrication: Methodology Demonstrated on a CMOS 14-nm FinFET Vehicle
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Process Model Calibration: The Key to Building Predictive and Accurate 3D Process Models
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Process Model Calibration: The Key to Building Predictive and Accurate 3D Process Models
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A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options done by Virtual Fabrication
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A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options done by Virtual Fabrication
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A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options: Comparing Bulk vs. SOI vs. DSOI Starting Substrates
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A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options: Comparing Bulk vs. SOI vs. DSOI Starting Substrates
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Influence of SiGe on Parasitic Parameters in PMOS
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Influence of SiGe on Parasitic Parameters in PMOS
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