FinFET and CFET Archives | Coventor

Process Model Calibration: The Key to Building Predictive and Accurate 3D Process Models
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Process Model Calibration: The Key to Building Predictive and Accurate 3D Process Models
A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options done by Virtual Fabrication
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A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options done by Virtual Fabrication
A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options: Comparing Bulk vs. SOI vs. DSOI Starting Substrates
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A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options: Comparing Bulk vs. SOI vs. DSOI Starting Substrates
Influence of SiGe on Parasitic Parameters in PMOS
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Influence of SiGe on Parasitic Parameters in PMOS
Self-aligned Fin Cut Last Patterning Scheme for Fin Arrays of 24nm Pitch and Beyond
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Self-aligned Fin Cut Last Patterning Scheme for Fin Arrays of 24nm Pitch and Beyond
N7 FinFET Self-Aligned Quadruple Patterning Modeling
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N7 FinFET Self-Aligned Quadruple Patterning Modeling
Understanding the Effect of Variability in Bulk FinFET Device Performance
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Understanding the Effect of Variability in Bulk FinFET Device Performance
Understanding how small variations in photoresist shape significantly impact multi-patterning yield
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Understanding how small variations in photoresist shape significantly impact multi-patterning yield
Self-aligned quadruple patterning to meet requirements for fins with high density
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Self-aligned quadruple patterning to meet requirements for fins with high density