February 22, 2021
Fig. 1. Key process steps comparison of the three structures.

The future of FinFETs at 5nm and beyond: Using combined process and circuit modeling to estimate the performance of the next generation of semiconductors

While contact gate pitch (GP) and fin pitch (FP) scaling continues to provide higher performance and lower power to FinFET platforms, controlling RC parasitics and achieving higher transistor performance at […]
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