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April 12, 2017
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April 12, 2017
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Coventor Blog
Photoresist shape in 3D: Understanding how small variations in photoresist shape significantly impact multi-patterning yield
Things were easy for integrators when the pattern they had on the mask ended up being the pattern they wanted on the chip. Multi-patterning schemes such as Self-Aligned Double Patterning
[…]
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